FeTiO3-.ALPHA.-Fe2O3 Solid Solution Films Prepared by a Reactive Vapor Deposition Technique.

Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition

Microstructure and optical properties of scandium oxide thin films prepared by metalorganic chemical-vapor deposition

Dense, high-index, and reproducible scandium oxide (Sc2O3) thin films with high mechanical strength were grown on glass substrates by metalorganic chemical-vapor deposition. The influence of deposition temperature on the microstructure evolution and optical properties of Sc2O3 thin films was investigated by x-ray diffraction, scanning electron microscopy, atomic-force microscopy, transmission e...

Potential phase control of chromium oxide thin films prepared by laser-initiated organometallic chemical vapor deposition

We have used laser-initiated chemical vapor deposition to grow the chromium oxide thin films through the oxidation of Cr~CO!6 in an oxygen environment. While both Cr2O3 and CrO2 are present in the film, the relative weight of each phase depends on the oxygen partial pressure. The Curie temperature of the film increases and approaches the bulk TC of CrO2 ~397 K! as the partial oxygen pressure is...

Highly spin-polarized chromium dioxide thin films prepared by chemical vapor deposition from chromyl chloride

Highly spin-polarized chromium dioxide (CrO2) thin films were deposited on ~100! TiO2 substrates by chemical vapor deposition using chromyl chloride as a precursor. The spin polarization, as measured by the point contact Andreev reflection technique, was 8163%. X-ray diffraction u/2u scans indicated the films grew completely ~100! oriented, in registry with the ~100! oriented TiO2 substrate. X-...

The Microstructure of Nanocrystalline TiB2 Films Prepared by Chemical Vapor Deposition

Nanocrystalline titanium diboride (TiB₂) ceramics films were prepared on a high purity graphite substrate via chemical vapor deposition (CVD). The substrate was synthesized by a gas mixture of TiCl₄, BCl₃, and H₂ under 1000 °C and 10 Pa. Properties and microstructures of TiB₂ films were also examined. The as-deposited TiB₂ films had a nano-sized grain structure and the grain size was around 60 ...